Available devices at Central Lab
Model: 202964 / Panalytical Empryan
It provides information on structures, phases, preferred crystal
orientations (texture), and other structural parameters, such as average
grain size, crystallinity, strain, and crystal defects.
Model: Vertex 70 / Bruker Optics
It is used for identifying the presence of Certain functional groups
inorganic molecules. Raman spectroscopy is Commonly used in chemistry.
It provides a fingerprint by which the molecule can be identified.
Model: 200 series AA/Agilent Technologies
Atomic Absorption Spectroscopy is a technique for determining the
concentration of a particular metal element within a sample.
GC system 7890A/5975C Inert MS with triple Axis Detector /
Agilent Technologies
It is an analytical device that combines the features of gas liquid
chromatography and mass spectroscopy to identify different substances
within a test sample.
Model: 1260 infinity / Agilent Technologies
This device is used for the separation and analysis of chemical and
biological compounds that are non – volatile.
The Nano-drop Spectrophotometer from Nano-drop Technologies is designed
for measuring nucleic acid concentrations in sample volumes of one
microliter.
Chemical vapor deposition system is an essential technique for
preparation of different nanomaterials such as CNTS, Graphene, Carbon
fibers,......,etc
Plasma-enhanced chemical vapor deposition (PECVD) is a process used to
deposit thin films from a gas state (vapor) to a solid state on a
substrate
Sputter deposition is a method of depositing thin films by sputtering
that involves eroding material from a "target" source onto a "substrate"
e.g. a silicon wafer. Resputtering, in contrast, involves re-emission
of the deposited material, e.g. SiO2 during the deposition also by ion
bombardment